Kartavya Kant Tiwari

Researchers at Australia's CSIRO have achieved a world-first demonstration of quantum machine learning in semiconductor fabrication. The quantum-enhanced model outperformed conventional AI methods and could reshape how microchips are designed. The team focused on modeling a crucial—but hard to predict—property called “Ohmic contact” resistance, which measures how easily current flows where metal meets a semiconductor. They analysed 159 experimental samples from advanced gallium nitride (GaN) transistors (known for high power/high-frequency performance). By combining a quantum processing layer with a final classical regression step, the model extracted subtle patterns that traditional approaches had missed. Tackling a difficult design problem According to the study, the CSIRO researchers first encoded many fabrication variables (like gas mixtures and annealing times) per device and used principal component analysis (PCA) to shrink 37 parameters down to the five most important ones. ...